IIT2026(イオン注入・アニール技術国際会議) 協賛・出展のお知らせ

2026年9月17 日～24日オーストリア フィラッハで開催される学会(IIT2026)にプラチナスポンサーとして協賛出展し、下記の論文を発表します。

是非弊社ブースまでお立ち寄りください。

 

開催日程：2026年9月17 日～9月24日

会場： Congress Centre Villach

ブース番号：#21 (1^st floor)

URL： https://www.iitvillach2026.com/  

 

 

【オーラル発表】

• Laser Irradiation Effect during Implant on Si and SiC Substrate
  by TaeHoon Huh
• Laser-assisted implantation method followed by an activation process by µs UV-laser annealing for the formation of highly doped p-type junctions in SiC
  by Shintaro Hirano

 

【ポスター発表】

• Deep and Flat Profile Formation by Tilt-Angle Modulation at Fixed Energy in High-Energy Ion Implantation
  by Shintaro Hirano
• Beam Position Measurement for a High-Energy Ion Implantation System
  by Mikio Yamaguchi
• Control of Film Thickness Distribution Within a Wafer by Mapping-Based Intentional Non-Uniform Dose Ion Implantation
  by Takuya Sakaguchi
• Enhanced Hydrogen Ion Beam Current for GSDIII-180
  by Hiroki Murooka
• Evaluation of Al Implantation Uniformity in 8-inch SiC Wafers by 4-Point-Probe Measurement
  by Shintaro Hirano
• High-Energy Multi-Step Channeling Implantation for Superjunction Structures in SiC
  by Akichika Ono
• UV Laser Annealing of Polycrystalline Silicon on Insulator
  by Anthony Albanese