Microsecond laser annealing system PRODUCTS Laser System

QA-3000 is a state-of-the-art laser annealing system that enable precise thermal budget control. As semiconductor devices continue require increasingly short and localized thermal treatments, QA-3000 has been developed as an innovative platform designed to meet these advanced technical demands.

With this original technology of UV laser capable of microsecond-level heating, QA-3000 delivers high-quality activation, crystallization, and curing processes essential for leading-edge semiconductor devices. Its applicability extends beyond silicon to wide-bandgap materials such as SiC and GaN, allowing performance improvements without compromising the intrinsic properties of each material.

In addition, QA-3000 features a compact, production-optimized design that significantly reduces the footprint compared with the previous LT-3100 system. The step-and-repeat irradiation architecture ensures excellent uniformity across different wafer sizes and material types. This flexible platform enables a seamless transition from process development to mass production, supporting dramatic gains in productivity.